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1

Applications of wear-resistant thick films formed by physical vapor deposition processes

Kazuo Nakamura, Konosuke Inagawa, Kazuyuki Tsuruoka, Souji Komiya

Journal:

Thin Solid Films

Year:

1977

Language:

english

File:

PDF, 756 KB

english, 1977

2

Formation of thick titanium carbide films by the hollow cathode discharge reactive deposition process

Souji Komiya, Nobuo Umezu, Tadashi Narusawa

Journal:

Thin Solid Films

Year:

1978

Language:

english

File:

PDF, 438 KB

english, 1978

3

Triggering sputter ion pumps in ultra-high vacuum

Souji Komiya, Horonobu Sato, Chikara Hayashi

Journal:

Year:

1967

Language:

english

File:

PDF, 152 KB

english, 1967

4

LEED and Auger electron spectroscopic observations of the substrate surface during sputtering and vacuum vapour deposition

Tadashi Narusawa, Souji Komiya

Journal:

Year:

1972

Language:

english

File:

PDF, 1.17 MB

english, 1972

5

Recent advances in vacuum techniques in Japan

Journal:

Year:

1992

Language:

english

File:

PDF, 201 KB

english, 1992

6

Dynamic simulation of ion implantation with damaging processes included

Tsutomu Saito, Hiroyuki Yamakawa, Souji Komiya, Hee Jae Kang, Ryuichi Shimizu

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

1987

Language:

english

File:

PDF, 272 KB

english, 1987

7

Enhancement of Noble Gas Pumping for a Sputter-Ion Pump

Journal:

Journal of Vacuum Science and Technology

Year:

1969

Language:

english

File:

PDF, 583 KB

english, 1969

8

Thermal input to substrate during deposition by hollow−cathode discharge

Journal:

Journal of Vacuum Science and Technology

Year:

1975

Language:

english

File:

PDF, 942 KB

english, 1975

9

Abstract: Electron beam deposition of alumina to rf modulated steel substrates

Journal:

Journal of Vacuum Science and Technology

Year:

1975

Language:

english

File:

PDF, 263 KB

english, 1975

10

Laser-induced fluorescence study of silicon etching process: Detection of SiF2 and CF2 radicals

Matsumi, Yutaka, Toyoda, Satoru, Hayashi, Toshio, Miyamura, Masao, Yoshikawa, Hideshi, Komiya, Souji

Journal:

Journal of Applied Physics

Year:

1986

Language:

english

File:

PDF, 798 KB

english, 1986

11

Physical vapor deposition of thick Cr and its carbide and nitride films by hollow-cathode discharge

Journal:

Journal of Vacuum Science and Technology

Year:

1976

Language:

english

File:

PDF, 1.00 MB

english, 1976

12

Mass and energy analysis of incident ions to substrate during deposition by hollow cathode discharge

Journal:

Journal of Vacuum Science and Technology

Year:

1977

Language:

english

File:

PDF, 840 KB

english, 1977

13

Numerical Analysis of the Transport Phenomena in MOCVD Process

Kusumoto, Yoshiro, Hayashi, Toshiro, Komiya, Souji

Journal:

Japanese Journal of Applied Physics

Year:

1985

File:

PDF, 799 KB

1985

14

A Molecular and Ion-Beam Epitaxy System for the Growth of III-V Compound Semiconductors Using a Mass-Separated, Low-Energy Group-V Ion Beam

Shimizu, Saburo, Tsukakoshi, Osamu, Komiya, Souji, Makita, Yunosuke

Journal:

Japanese Journal of Applied Physics

Year:

1985

File:

PDF, 2.75 MB

1985

15

Photo-Ionizalion Assisted Photo-CVD of Silicon Nitride Film by Microwave-Excited Deuterium Lamp

Tamagawa, Kouichi, Hayashi, Toshio, Komiya, Souji

Journal:

Japanese Journal of Applied Physics

Year:

1986

File:

PDF, 475 KB

1986

16

A Simple Ion Energy Analyser Equipped with a Quadrupole Mass Spectrometer

Satake, Tohru, Narusawa, Tadashi, Tsukakoshi, Osamu, Komiya, Souji

Journal:

Japanese Journal of Applied Physics

Year:

1976

Language:

english

File:

PDF, 315 KB

english, 1976

17

UHV-IMMA Development and Application to Hydrogen Detection

Satake, Tohru, Tsukakoshi, Osamu, Shimizu, Akira, Komiya, Souji

Journal:

Japanese Journal of Applied Physics

Year:

1981

Language:

english

File:

PDF, 191 KB

english, 1981

18

Photo-CVD of Dielectric Films by a Microwave-Excited VUV Lamp

Tamagawa, Kouichi, Hayashi, Toshio, Komiya, Souji

Journal:

MRS Proceedings

Year:

1986

Language:

english

File:

PDF, 1.42 MB

english, 1986

19

10.2320/materia1962.15.735

Journal:

Bulletin of the Japan Institute of Metals

Year:

1976

File:

PDF, 7.24 MB

1976

20

10.2320/materia1962.20.91

Journal:

Bulletin of the Japan Institute of Metals

Year:

1981

File:

PDF, 1.02 MB

1981

21

10.2320/materia1962.17.117

Journal:

Bulletin of the Japan Institute of Metals

Year:

1978

File:

PDF, 2.80 MB

1978

22

10.4139/sfj1950.29.166

Journal:

Journal of the Metal Finishing Society of Japan

Year:

1978

File:

PDF, 2.46 MB

1978

23

10.3131/jvsj.27.280

HAYASHI, Toshio, KOMIYA, Souji

Journal:

Year:

1984

File:

PDF, 1.26 MB

1984

24

Pumping Speed of Cylindrical Magnetron Sputter Ion Pump for Ar, CH4, He, H2.

TAKAHASHI, Naoki, Xu, Minsheng, KOMIYA, Souji

Journal:

Year:

1995

File:

PDF, 377 KB

1995

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